SILICON PURIFICATION METHOD AND SILICON PURIFICATION DEVICE
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United States of America Patent
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app pub date -
Nov 8, 2013
filing date -
Sep 18, 2009
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Abstract
The silicon purification method uses a silicon purification device including at least a crucible for loading a silicon metal and a plasma torch, and purifies the silicon metal by injecting a plasma gas from the plasma torch toward a melt surface of the silicon metal loaded in the crucible in a state where an angle formed by the melt surface and the plasma gas is set in the range of 20° to 80°.
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