Method for Modifying a Surface of a Substrate using Ion Bombardment
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United States of America Patent
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Mar 13, 2014
app pub date -
Mar 14, 2012
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Mar 14, 2011
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Abstract
A process is described for modification of a surface of a substrate by ion bombardment, in which the ions are produced by means of a magnetic field-assisted glow discharge in a process gas. The magnetic field-assisted glow discharge is produced by means of a magnetron having an electrode and at least one magnet for production of the magnetic field. The process gas has at least one electronegative constituent, such that negative ions are produced in the magnetic field-assisted glow discharge, and the negative ions which are produced at the surface of the electrode are accelerated in the direction of the substrate by an electrical voltage applied to the electrode.
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