PROCESSING METHOD UTILIZING CLUSTER
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United States of America Patent
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N/A
Issued Date -
Mar 6, 2014
app pub date -
Feb 27, 2013
filing date -
Aug 30, 2012
priority date (Note) -
Published
status (Latency Note)
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Abstract
A processing method having excellent processing performance at a low flow rate is provided. A method for processing a surface of a sample uses reactive clusters produced by adiabatic expansion of a gas mixture ejected from a nozzle into a vacuum processing chamber. The gas mixture contains a reactive gas chlorine trifluoride, a first inert gas argon, and a second inert gas xenon. The gas mixture in an inlet of the nozzle has a pressure of 0.4 MPa (abs) or more. The reactive gas constitutes 3% by volume or more and 10% by volume or less. The first inert gas constitutes 40% by volume or more and 94% by volume or less. The second inert gas constitutes 3% by volume or more and 50% by volume or less of the gas mixture.
First Claim
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Family
| Country | kind | publication No. | Filing Date |
|---|---|---|---|
| JP | B2 | JP5964182 | Aug 30, 2012 |
| KR | B1 | KR102036195 | Feb 27, 2013 |
International Classification(s)
- 2013 Application Filing Year
- C23F Class
- 303 Applications Filed
- 260 Patents Issued To-Date
- 85.81 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- C23F Class
- 11.17 % this patent is cited more than
- 11 Age