DUAL FRICTION LOOP FLUID FLOW RESISTANCE MEASUREMENT APPARATUS
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United States of America Patent
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Issued Date -
Mar 6, 2014
app pub date -
Sep 6, 2012
filing date -
Sep 6, 2012
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Abandoned
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Abstract
A fluid flow resistance modifying chemical additive system includes a flow loop, a first friction loop flow resistance measuring system coupled proximate an inlet side of the flow loop, at least one chemical additive device downstream of the first friction loop in the flow loop and a second friction loop flow resistance measuring system coupled proximate an outlet side of the flow loop. A method for continuous measuring effect of at least one flow resistance chemical additive on a base fluid include pumping the base fluid into a flow loop. A property of the base fluid is measured. At least one modifying chemical is added to the base fluid. The property of the combined base fluid and at least one flow resistance modifying chemical is then measured and/or modified with respect to the flow resistance properties of the base fluid.
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