METHOD FOR N-DOPING GRAPHENE

Number of patents in Portfolio can not be more than 2000

United States of America Patent

SERIAL NO

14016665

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present disclosure provides an n-doping method of graphene, including supplying a reaction gas containing a carbon source and heat to a substrate and reacting to grow graphene on the substrate; and n-doping the graphene by a doping solution containing an n-type dopant or a vapor containing an n-type dopant, an n-doped graphene produced by the method, and a device including the n-doped graphene.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
GRAPHENE SQUARE INC(SAMSEONG-DONG) 301 18 BONGEUNSA-RO 72-GIL GANGNAM-GU SEOUL 135-509 SEOUL

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HONG, Byung Hee Seoul, KR 53 710
KIM, Eun Seon Seoul, KR 5 40

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation