Method of manufacturing nanoimprint stamp
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United States of America Patent
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Jun 3, 2014
Grant Date -
Feb 27, 2014
app pub date -
Nov 5, 2013
filing date -
Dec 15, 2010
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Abstract
Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.
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