DEPOSITION DEVICE AND DEPOSITION METHOD USING JOULE HEATING
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United States of America Patent
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Issued Date -
Feb 20, 2014
app pub date -
Aug 20, 2012
filing date -
Aug 20, 2012
priority date (Note) -
Abandoned
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Abstract
Provided are a deposition method of patterning a thin film on a substrate using momentary Joule heating in a vacuum environment, and a method thereof. The deposition device forms a deposition target layer on one surface of a source substrate as a pattern to be deposited. A deposition target layer forming unit forms a deposition target layer on the one surface of the source substrate to cover the conductive layer. A chamber in a vacuum state receives the source substrate on which the conductive layer and the deposition target layer are formed and the target substrate. A target substrate is disposed in the chamber to face the source substrate. A power supply applies power to the conductive layer to heat-generate the conductive layer. A configuration of the deposition device is very simple, and it is easy to uniformly form a deposition thickness.
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