SPUTTERING TARGET AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING BLACK MATRIX DEPOSITED THEREBY
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United States of America Patent
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Issued Date -
Feb 20, 2014
app pub date -
Aug 8, 2013
filing date -
Aug 16, 2012
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Abandoned
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Abstract
A sputtering target that can form a black matrix having high-resistance and low-reflection characteristics and an organic light-emitting display device including the black matrix deposited thereby. The sputtering target that is used in a sputtering process for depositing a black matrix contains one selected from the group consisting of Mo—Si—O, W—Si—O and Mo—W—Si—O, the content of the Mo or W being at least 0.5 times the content of the Si.
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