APPARATUS AND SYSTEM FOR DETERMINING, OPTIMIZING OR MONITORING AT LEAST ONE PROCESS VARIABLE
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United States of America Patent
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app pub date -
Mar 15, 2012
filing date -
Apr 7, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An apparatus for determining or monitoring at least one process variable which comprises a sensor element, measuring electronics, at least one control/evaluating/calculating unit arranged removed from the measuring unit and/or an in/output unit arranged removed from the measuring unit and the control/evaluating/calculating unit. The control/evaluating/calculating unit and the in/output unit are connected with the measuring unit via a first interface, respectively a second interface, wherein the measuring electronics operates the sensor element and forwards the measurement signals via the interfaces to the control/evaluating/calculating unit as unprocessed, raw, measured values, and wherein the control/evaluating/calculating unit arranged removed from the measuring unit determines, improves and/or monitors the process variable based on the raw, measured values and makes such available via the in/output unit.
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Patent Citation Ranking
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- G05B Class
- 5.30 % this patent is cited more than
- 11 Age