Large Area Patterning of Nano-Sized Shapes
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United States of America Patent
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app pub date -
Sep 9, 2013
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Nov 13, 2008
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Abandoned
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Abstract
Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
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