SUCCESSIVE GAS HYDRATE MANUFACTURING DEVICE
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United States of America Patent
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Issued Date -
Jan 16, 2014
app pub date -
Mar 13, 2012
filing date -
Mar 29, 2011
priority date (Note) -
Abandoned
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Abstract
Embodiments of the inventive concept provide a successive gas hydrate manufacturing device, without hydration after generating gas hydrate slurry, capable of operating with a higher conversion rate and relatively low hydrate generation pressure and reducing a product cost by decreasing the number of processing steps for removing heat of reaction, for which the total exothermic value downs due to no need of latent heat according to a phase change rather than the case of generating a gas hydrate directly from a water solution, as well as making gas diffusion easier during reaction of generation and maximizing a contact area between water and gas to increase a gas capture rate and shorten the total hydrate generation time.
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