POLYIMIDE PRECURSOR SOLUTION, POLYIMIDE PRECURSOR, POLYIMIDE RESIN, MIXTURE SLURRY, ELECTRODE, MIXTURE SLURRY PRODUCTION METHOD, AND ELECTRODE FORMATION METHOD

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United States of America Patent

SERIAL NO

14006258

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Abstract

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The invention addresses the problem of providing a polyimide precursor, a polyimide precursor solution, and a mixture slurry, each capable of more firmly binding active material particles to a current collecting body. The polyimide precursor solution according to the invention contains a tetracarboxylic acid ester compound, a diamine compound having an anionic group, and a solvent. The solvent dissolves the tetracarboxylic acid ester compound and the diamine compound. As the tetracarboxylic acid ester compound, a 3,3′,4,4′-benzophenonetetracarboxylic acid diester is particularly preferred. Examples of the “diamine compound having an anionic group” include 3,4-diaminobenzoic acid, 3,5-diaminobenzoic acid, and m-phenylenediamine-4-sulfonic acid. Further, the mixture slurry according to the invention contains active material particles in the polyimide precursor solution.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY3-1 KASUMIGASEKI 1-CHOME CHIYODA-KU TOKYO 1008921 ?1008921
I S T CORPORATION5-13-13 ICHIRIYAMA OTSU-SHI SHIGA 5202153 ?5202153

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Eda, Yuusuke Osaka, JP 2 14
Miyuki, Takuhiro Osaka, JP 15 109
Nimura, Yoshihito Shiga, JP 2 14
Okuyama, Yasue Osaka, JP 5 29
Sakai, Tetsuo Osaka, JP 129 759
Sawa, Kazuki Shiga, JP 13 65
Yamada, Hiroshi Shiga, JP 707 8311

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