SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS
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United States of America Patent
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Issued Date -
Jan 9, 2014
app pub date -
Jul 9, 2012
filing date -
Jul 9, 2012
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Abandoned
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Abstract
A substrate treating method including: a coating step in which a coating film of a liquid material comprising a metal and a solvent is formed on a first substrate and a second substrate; and a heating step in which the coating film is heated in a state where the first substrate and the second substrate are held in a manner such that the coating film formed on the first substrate faces the coating film formed on the second substrate.
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