Electrostatic Clamp Apparatus And Lithographic Apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20140002805A1
SERIAL NO

14004199

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akkermans, Johannes Antonius Gerardus Eindhoven, NL 15 65
Banine, Vadim Yevgenyevich Deurne, NL 222 2976
Cadee, Theodorus Petrus Maria Asten, NL 46 447
Loopstra, Erik Roelof Eindhoven, NL 325 13468
Scaccabarozzi, Luigi Valkenswaard, NL 22 245
Valentin, Christiaan Louis Eindhoven, NL 13 29

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation