CLICHE FOR OFFSET-PRINTING AND METHOD FOR MANUFACTURING SAME

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United States of America Patent

SERIAL NO

13973063

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Abstract

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The present invention relates to a cliché for offset printing and a method of manufacturing the same, and the cliché for offset printing according to the present invention comprises: a groove pattern, wherein a depth of at least a partial region of the groove pattern is different from a depth of a residual region. The present invention may comprise a double etching process when a cliché for offset printing is manufactured to control a bottom touch phenomenon that is a problem exhibited when a known wide line width is implemented, thus manufacturing the cliché for offset printing having various line widths and etching depths.

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Patent Owner(s)

Patent OwnerAddress
LG CHEM LTDSEOUL SOUTH KEREAN SEOUL

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HWANG, Ji Young Daejeon, KR 88 400
KOO, Beom Mo Daejeon, KR 29 148

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