Method and Apparatus for Removing Contaminants from Nitrogen Trifluoride
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United States of America Patent
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Issued Date -
Dec 26, 2013
app pub date -
Jun 7, 2013
filing date -
Jun 21, 2012
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Abandoned
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Abstract
A highly pure nitrogen fluoride process fluid having an impurity content of 10 ppm or less can be effectively obtained by using radiation to cause the dissociation of chemical bonds in the impurity to form dissociation products and thereby make the removal of the dissociation products from the process fluid easier than the removal of the impurity from the process fluid.
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