Importance

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Abstract

An improved reinforcement and exhaust arrangement is provided for a reduced pressure processing chamber. The arrangement is particularly advantageous for plasma processing chambers of large substrates (one square meter or larger) under a reduced pressure. The arrangement includes channels formed along sidewalls of the process chamber, and into which exhaust outlets from the chamber communicate. The channels provide support to the sidewalls and convey the exhaust gases to a port at a location at which the gases can be conveniently pumped from the system. In an example, plural outlets from the chamber are in communication with a common channel or channels which provide a flow path to a single exhaust port. As a result, although plural outlets extend from the interior of the chamber to the exterior of the chamber, only a single connection to the exhaust pump need be provided.

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First Claim