VACUUM DEPOSITION DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 26, 2013
app pub date -
Mar 12, 2012
filing date -
Mar 16, 2011
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention provides a vacuum deposition device that can improve the measurement accuracy of the thickness of the deposition film. The vacuum deposition device includes, in a vacuum chamber, a plurality of evaporation sections, a deposition target, a tubular body surrounding a space between the plurality of evaporation sections and the deposition target, and a film thickness meter. Deposition material vaporized from the plurality of evaporation sections passes through tubular body, reaches a surface of the deposition target, and is deposited on surface. Between film thickness meter and at least one of the evaporation sections, a guide tube is disposed which guides deposition material vaporized from the evaporation section to film thickness meter. An opening surface of the guide tube on the evaporation section side is disposed at substantially the same level as that of the opening surface of the evaporation section or inside the evaporation section.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully