APPARATUS AND METHOD FOR FORMING THIN PROTECTIVE AND OPTICAL LAYERS ON SUBSTRATES
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United States of America Patent
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Issued Date -
Dec 19, 2013
app pub date -
Jun 19, 2013
filing date -
Jun 19, 2012
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Abandoned
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Abstract
A method and apparatus are provided for plasma-based processing of a substrate based on a plasma source having at least two adjacent electrodes positioned with the long dimensions parallel to define a first gap minimum between the two electrodes of from 5 millimeters to 40 millimeters. A second gap minimum is defined between the two electrodes and the substrate. AC power is provided to the two electrodes through separate electrical circuits from a common supply with the phase difference therebetween. A first gas and a second are injected into the plasma-containing volume between the two electrodes are different positions relative to the substrate. A lower electrode with a lower electrode width that is less than the combined width of the two electrodes is powered from a separately controllable ac power supply at an ac frequency different from that supplied to the two electrodes.
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