METHOD FOR HYDROGEN PLASMA TREATMENT OF A TRANSPARENT CONDUCTIVE OXIDE (TCO) LAYER
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United States of America Patent
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Issued Date -
Dec 19, 2013
app pub date -
Jun 18, 2013
filing date -
Jun 18, 2012
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Abandoned
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Abstract
A method for fabricating a thin film solar device that includes providing a substrate having a transparent conductive oxide (TCO) layer deposited on a surface of the substrate, the TCO layer having an as deposited sheet resistance. At least a portion of a surface of the TCO layer is exposed to a hydrogen plasma under conditions which result in a treated TCO layer having a reduced sheet resistance which is at least 10% less than the as deposited sheet resistance.
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