METHOD FOR MASK INSPECTION, AND MASK INSPECTION INSTALLATION
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United States of America Patent
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Issued Date -
Dec 19, 2013
app pub date -
Dec 8, 2011
filing date -
Dec 17, 2010
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Abstract
The invention relates to a method for mask inspection and to a mask inspection installation. A method according to the invention involves a lighting system lighting a mask with a lighting beam pencil, and said mask being observed with an observation beam pencil which is directed onto a sensor arrangement, wherein the light hitting the sensor arrangement is evaluated in order to check the mapping effect of the mask. The lighting system produces a spot of light with limited refraction on the mask, and during the evaluation of the light hitting the sensor arrangement a finite component of the light setting out from the mask to produce the observation beam pencil is disregarded.
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