MULTILAYER BUILD PROCESSES AND DEVICES THEREOF

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United States of America Patent

SERIAL NO

13965524

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process to form devices may include forming a seed layer on and/or over a substrate, modifying a seed layer selectively, forming an image-wise mold layer on and/or over a substrate and/or electrodepositing a first material on and/or over an exposed conductive area. A process may include selectively applying a temporary patterned passivation layer on a conductive substrate, selectively forming an image-wise mold layer on and/or over a substrate, forming a first material on and/or over at least one of the exposed conductive areas and/or removing a temporary patterned passivation layer. A process may include forming a sacrificial image-wise mold layer on a substrate layer, selectively placing one or more first materials in one or more exposed portions of a substrate layer, forming one or more second materials on and/or over a substrate layer and/or removing a portion of a sacrificial image-wise mold layer.

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Patent Owner(s)

Patent OwnerAddress
NUVOTRONICS INC2305 PRESIDENTIAL DRIVE DURHAM NC 27703

International Classification(s)

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  • 2013 Application Filing Year
  • H01F Class
  • 1453 Applications Filed
  • 1301 Patents Issued To-Date
  • 89.54 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20132014201520162017201820192020202120220255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sherrer, David Radford, US 29 814

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Patent Citation Ranking

  • 9 Citation Count
  • H01F Class
  • 8.23 % this patent is cited more than
  • 12 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges34282671346411101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7091 - 100100 +020406080100120140160180200220240260280300

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