Moisture activated phantom imaging process and product
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United States of America Patent
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Sep 30, 2014
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app pub date -
Aug 5, 2013
filing date -
Jun 26, 2011
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Abstract
Moisture-activated invisible stencil technology is created by applying a moisture-blocking agent in accordance with an artwork is applied to a base substrate. The base substrate is preferably fabricated of a moisture absorbing material. When the object is subjected to moisture, moisture wets to the exposed portion of the base substrate and is repelled in the areas where the moisture-blocking agent is applied thereon. The wetted portion of the base substrate changes in shade or color to expose the concealed image. The moisture-activated invisible stencil technology can be applied for simple aesthetic applications or advanced for applications to identify wet objects. The advanced applications can include warnings for wet roadways, pool decks, umbrellas, and the like.
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