CMP PAD DRESSER WITH ORIENTED PARTICLES AND ASSOCIATED METHODS
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United States of America Patent
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Issued Date -
Nov 28, 2013
app pub date -
Oct 30, 2012
filing date -
Sep 29, 2004
priority date (Note) -
Abandoned
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Abstract
CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser wear.
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