METHOD FOR PRODUCING SILICON DIOXIDE FILM

United States of America Patent

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Issued Date
Nov 28, 2013
app pub date
Feb 16, 2012
filing date
Feb 17, 2011

priority date (Note)
Abandoned

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Abstract

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[Problem] To provide a method capable of forming an insulating film suffering less from both shrinkage and stress.

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Patent Owner(s)

Patent Owner	Address
MERCK PATENT GMBH	DARMSTADT FEDERAL REPUBLIC OF GERMANY DARMSTADT HESSIAN

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hayashi, Masanobu	Shizuoka, JP	14	165
Nagahara, Tatsuro	Shizuoka, JP	38	144
Suzuki, Katsuchika	Shizuoka, JP	4	14

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11.5 Year Payment	$7400.00	$3700.00	$1850.00	May 28, 2025

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Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
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Number of patents in all portfolios	100 (maximum)	1000 (maximum)	2000 (maximum)	Unlimited
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Number of patents in all portfolios	100 (maximum)	1000 (maximum)	2000 (maximum)	Unlimited
Follows in all categories (Watch)	10 (maximum)	50 (maximum)	500 (maximum)	Unlimited
Maximum number of portfolios	5 (maximum)	10 (maximum)	100 (maximum)	Unlimited
Maximum number of comparisons	1 (maximum)	5 (maximum)	20 (maximum)	Unlimited

METHOD FOR PRODUCING SILICON DIOXIDE FILM

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13982359

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13982359

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Importance

Abstract

First Claim

Family

Patent Owner(s)

International Classification(s)

Inventor(s)

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Patent Citation Ranking

Forward Cite Landscape

Maintenance Fees

Full Text

Legal Events

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Load PAIR data

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Cancel Scheduled Update

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File History PDF

Add to Portfolio(s)

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