INFRARED REFLECTIVE SUBSTRATE

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United States of America Patent

APP PUB NO 20130308180A1
SERIAL NO

13983237

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Disclosed herein is an infrared reflective substrate that can be easily produced by application onto the surface of a base material, has a film having a small film thickness, and achieves both high light permeability and excellent infrared reflective performance. The infrared reflective substrate includes: a transparent base material; and an infrared reflective layer formed by applying a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion onto the transparent base material, and has a total light transmittance of 60% or higher. The complex preferably has a conductivity of 0.15 (S/cm) or higher, and the infrared reflective layer preferably has a film thickness of 0.50 μm or less.

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Patent Owner(s)

Patent OwnerAddress
NAGASE CHEMTEX CORPORATIONOSAKA-SHI OSAKA 550-8668

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Takafumi Tatsuno-shi, JP 31 527
Hosomi, Tetsuya Tatsuno-shi, JP 16 56
Miyanishi, Kyoko Tatsuno-shi, JP 3 78

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