METHOD OF MANUFACTURING THREE-DIMENSIONAL NANOCHANNEL DEVICE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
Jul 22, 2013
filing date -
Apr 14, 2011
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method of manufacturing a three-dimensional nanochannel device is provided. In the method, a first insulation layer is formed on a substrate, a first opening is formed in the first insulation layer, and a patterned photoresist is formed on the first insulation layer. The patterned photoresist includes at least one second opening, wherein the second opening is adjacent to the first opening and exposes the first insulation layer. Afterwards, the first insulation layer is etched and the substrate is also continued to be etched by using the patterned photoresist as a mask, so as to form a housing space, wherein a depth of the housing space is at least two orders greater than a thickness of the first insulation layer. Thereafter, the patterned photoresist is removed, and a second insulation layer is formed on a surface of the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully