Stable Cavity-Induced Two-Phase Heat Transfer in Silicon Microchannels
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United States of America Patent
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Issued Date -
Nov 21, 2013
app pub date -
Jul 25, 2013
filing date -
May 31, 2007
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Abandoned
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Abstract
The stable cavity-induced two-phase heat transfer in silicon microchannels mitigates the flow of instabilities associated with two-phase (liquid/vapor) flow in microchannels. This is accomplished by etching microscopic cavities in the base of each microchannel using photolithography techniques. Each cavity is used to promote controlled nucleation activity. The microchannels with cavities are able to be used in heat sinks to cool a variety of electronic components.
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