PLASMA PROCESSING DEVICE

United States of America Patent

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Issued Date
Nov 21, 2013
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Feb 2, 2012
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Feb 2, 2011

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Abstract

Provided is a plasma processing device (S1) configured to perform surface reforming on a workpiece (X) made of a metal material in a vacuum furnace (1) by plasma includes movable power feeding devices (14 and 15) that are movable in the vacuum furnace (1).

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Patent Owner(s)

Patent Owner	Address
IHI CORPORATION	TOKYO
IHI MACHINERY AND FURNACE CO LTD	12-32 KONAN 2-CHOME MINATO-KU TOKYO 108-0075

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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Inventor Name	Address	# of filed Patents	Total Citations
Katsumata, Kazuhiko	Tokyo, JP	46	141

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PLASMA PROCESSING DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13981836

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13981836

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