CO-EVAPORATION SYSTEM COMPRISING VAPOR PRE-MIXER
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United States of America Patent
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Issued Date -
Nov 14, 2013
app pub date -
Jul 2, 2012
filing date -
May 11, 2012
priority date (Note) -
Abandoned
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Abstract
A processing system for depositing a plurality of source materials on a substrate, includes a first thermal evaporation source that can evaporate a first source material to produce a first vapor, a second thermal evaporation source that can evaporate a second source material to produce a second vapor, a vapor mixing chamber that allows the first vapor and the second vapor to be mixed to produce a mixed vapor, and conduits that can separately transport the first vapor and the second vapor to the vapor mixing chamber. The mixed vapor can be directed toward a substrate to deposit a mixture of the first source material and the second source material on the substrate. The processing system can also include vapor filters configured to regulate flows of the first vapor and the second vapor, and a mixed vapor filter to regulate flow of the mixed vapor.
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