METHODS OF TEXTURING SURFACES FOR CONTROLLED REFLECTION
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United States of America Patent
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Issued Date -
Nov 7, 2013
app pub date -
May 3, 2012
filing date -
May 3, 2012
priority date (Note) -
Abandoned
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Abstract
Novel methods for the texturing of photovoltaic cells is described, wherein texturing minimizes reflectance losses and hence increases solar cell efficiency. In one aspect, a microstamp with the mirror inverse of the optimum surface structure is described. The photovoltaic cell substrate to be etched and the microstamp are immersed in a bath and pressed together to yield the optimum surface structure. In another aspect, micro and nanoscale structures are introduced to the surface of a photovoltaic cell by wet etching and depositing nanoparticles or introducing metal induced pitting to a substrate surface. In still another aspect, remote plasma source (RPS) or reactive ion etching (RIE), is used to etch nanoscale features into a silicon-containing substrate.
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