Inverted Evaporation Apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20130287947A1
SERIAL NO

13854838

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A deposition apparatus includes one or more evaporation sources each of which includes a container comprising an opening and configured to hold a source material, a source heater adjacent to and in thermal communication with the container, wherein the source heater is configured to elevate temperature of the source material to produce a vapor of the source material, and a source enclosure that encloses the container and the source heater. The source enclosure includes a vent configured to direct the vapor of the source material towards a substrate. The deposition apparatus includes also a plurality of substrate heaters in thermal communication with the substrate. The substrate includes a deposition surface configured to receive deposition of the source material by condensing the vapor. The plurality of substrate heaters can heat different portions of the substrate to different temperatures.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
AREESYS TECHNOLOGIES INC4055 CLIPPER COURT FREMONT CA 94538

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lin, Enhao Fremont, US 5 497
Ting, Albert San Jose, US 13 442
Wang, Kai-An Cupertino, US 32 737
Wong, Michael Castro Valley, US 77 2995

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation