METHOD FOR SCALING PLASMA REACTORS FOR GAS TREATMENT AND DEVICES THEREFROM
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United States of America Patent
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Issued Date -
Oct 31, 2013
app pub date -
Mar 15, 2013
filing date -
Oct 1, 2010
priority date (Note) -
Abandoned
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Abstract
Systems and methods for the treatment of a gas are provided. A method includes providing multiple discharge chambers defined by dielectric sections, where each of the discharge chambers comprises sets of electrodes for producing electric fields in the discharge chambers, where the dielectric sections and the sets of electrodes are arranged to define a volume that inhibits the formation of volume-streamers and the discharge chambers are configured to either prevent pulsed electric fields generated in adjacent discharge chambers from substantially interacting or to allow interaction in constructive way. The method also includes directing the gas into the discharge chambers and treating the gas using a corona discharge in the discharge chambers produced by a pulsed electric field generated by each of the sets of the first and second electrodes in the discharge chambers, where the pulsed electric field is configured to produce the corona discharge to have surface-streamers and volume-streamers.
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