METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER-SHAPED ARTICLES
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United States of America Patent
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Issued Date -
Oct 31, 2013
app pub date -
Apr 25, 2012
filing date -
Apr 25, 2012
priority date (Note) -
Abandoned
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Abstract
An in-line mixing system provides a process liquid for treatment of wafer-shaped articles. The system comprises a first flow regulator configured to regulate flow of a first liquid stream, a second flow regulator configured to regulate flow of a second liquid stream having a chemical component, a refractive index meter configured to provide a refractive index measurement of a mixture of the first and second liquid streams, a combined flow meter configured to provide a combined flow measurement of the mixture of the first and second liquid streams, and an automatic controller. The automatic controller is configured to operate the first and second flow regulators based upon the refractive index measurement and the combined flow measurement.
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