Concentration Measuring Device used in Manufacturing Process
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United States of America Patent
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Issued Date -
Oct 17, 2013
app pub date -
Apr 11, 2013
filing date -
Apr 12, 2012
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Abandoned
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Abstract
A semiconductor manufacturing system comprises a main body that exclusively flows a first fluid that is used in a manufacturing process and a second fluid whose concentration is known, and that outputs a state signal showing whether or not the fluid flowing in the flow channel is the second fluid and a concentration measuring device having a concentration measuring part that measures a concentration of a predetermined component in the fluid flowing in the flow channel, a state signal receiving part that receives the state signal from the main body, and a correcting part that obtains a reference measurement value as being a measurement value measured by the concentration measuring part during a period while it is judged that the second fluid flows in the flow channel by the state signal and that corrects the concentration measuring part based on the reference measurement value.
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