APPARATUS FOR THE DEPOSITION OF DIAMONDS BY MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS AND SUBSTRATE STAGE USED THEREIN
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United States of America Patent
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Issued Date -
Oct 17, 2013
app pub date -
Apr 12, 2012
filing date -
Apr 12, 2012
priority date (Note) -
Abandoned
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Abstract
The present invention is related to an apparatus for the manufacture of gem grade diamonds. The apparatus has a plurality chambers (52) arranged in series to allow gas flow from a first chamber to a last chamber. Each chamber has a substrate stage assembly (10) to support a plurality of diamond seeds (19), a microwave generator (36) and a microwave source (38) to supply microwave energy into the chamber via a microwave arrangement (37)). A gas supply (54) to supply gases to form the diamonds to the first chamber. The gases supplied to the first chamber are used in sequence with the gases exiting the first chamber becoming the input for a second chamber and then subsequent chambers in series. A vacuum pump is after the final vacuum chamber.
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