PROCESS FOR PRODUCING A REFLECTION-REDUCING INTERFERENCE LAYER SYSTEM AS WELL AS REFLECTION-REDUCING INTERFERENCE LAYER SYSTEM
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United States of America Patent
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Issued Date -
Oct 17, 2013
app pub date -
Apr 10, 2013
filing date -
Apr 11, 2012
priority date (Note) -
Abandoned
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Abstract
A process for producing a reflection-reducing interference layer system is provided, in which a stack of layers is formed by applying to a surface of a substrate several layers which have alternately a high refractive index and a low refractive index, and a nanoporous final layer is applied to the stack of layers by vapour deposition of the material of the final layer at an oblique angle relative to the normal of the top layer of the stack of layers such that the refractive index of the final layer is lower than the refractive index of the top layer of the stack of layers.
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