SHAPING OFFSET ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DRAWING APPARATUS
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United States of America Patent
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Issued Date -
Oct 3, 2013
app pub date -
Mar 26, 2013
filing date -
Mar 29, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A shaping offset adjustment method, comprising: checking a reference point formed by an overlap of first and second shaping apertures included in a charged particle beam drawing apparatus; changing a position of the first shaping aperture by deflecting a charged particle beam so that an overlap area of the first and second shaping apertures has a predetermined shot size; measuring a current value of the charged particle beam passing through the overlap area; performing fitting on a relationship between the shot size and the corresponding current value using a cubic polynomial to calculate coefficients of the cubic polynomial achieving best fit; and correcting a shaping offset amount using the calculated coefficients of the cubic polynomial.
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