LASER PROCESSING USING AN ASTIGMATIC ELONGATED BEAM SPOT AND USING ULTRASHORT PULSES AND/OR LONGER WAVELENGTHS
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United States of America Patent
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app pub date -
May 30, 2013
filing date -
Dec 7, 2009
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Abandoned
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Abstract
An adjustable astigmatic elongated beam spot may be formed from a laser beam having ultrashort laser pulses and/or longer wavelengths to machine substrates made of a variety of different materials. The laser beam may be generated with pulses having a pulse duration of less than 1 ns and/or having a wavelength greater than 400 nm. The laser beam is modified to produce an astigmatic beam that is collimated in a first axis and converging in a second axis. The astigmatic beam is focused to form the astigmatic elongated beam spot on a substrate, which is focused on the substrate in the first axis and defocused in the second axis. The astigmatic elongated beam spot may be adjusted in length to provide an energy density sufficient for a single ultrashort pulse to cause cold ablation of at least a portion of the substrate material.
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