Epitaxial Deposition Apparatus, Gas Injectors, and Chemical Vapor Management System Associated Therewith
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United States of America Patent
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Issued Date -
Sep 26, 2013
app pub date -
Nov 30, 2011
filing date -
Nov 30, 2010
priority date (Note) -
Abandoned
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Abstract
An epitaxial deposition apparatus comprises a deposition chamber with at least one gas injector having a gas injection surface and a substrate support having a deposition surface; and at least one vacuum pump having a gas aperture in fluid communication with the deposition chamber and facing the gas injection surface of the at least one gas injector, the substrate support being inter-posed between the at least one gas injector and the gas aperture of the at least one vacuum pump. The invention also relates to an epitaxial deposition gas injector and a nozzle for an epitaxial deposition gas injector. Furthermore, the invention relates to a gas supply and handling system for an epitaxial deposition apparatus.
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