SILICON REFINING DEVICE AND SILICON REFINING METHOD

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United States of America Patent

SERIAL NO

13903321

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Abstract

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A technology for removing impurities from a silicon raw material at a low cost. A base material made of metallurgical silicon is arranged in a dissolution vessel, the base material arranged in the dissolution vessel is heated in a vacuum ambience and fully molten, silicon is solidified from a portion where an inner bottom surface of the dissolution vessel is in contact with molten silicon by cooling the outer bottom surface of the dissolution vessel in a state where the outer bottom surface faces the cooling means, spaced from the cooling means, the solidificated silicon is made to grow upward, and unsolidificated silicon located above the solidificated silicon is removed from the dissolution vessel.

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Patent Owner(s)

Patent OwnerAddress
ULVAC INCKANAGAWA JAPAN KANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
OOKUBO, Yasuo Tomisato-shi, JP 7 4

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