DUAL ANGLES OF INCIDENCE AND AZIMUTH ANGLES OPTICAL METROLOGY
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United States of America Patent
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Issued Date -
Sep 19, 2013
app pub date -
Mar 13, 2012
filing date -
Mar 13, 2012
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Abstract
A dual optical metrology system includes a first metrology device and a second metrology device, each producing light at different oblique angles of incidence on the same spot of a sample from different azimuth angles. The dual optical metrology system further includes a rotating stage or flip mirrors capable of altering the orientation of the light beams so the first and second metrology devices can measure the same spot on the sample at different orientations. Thus, the first and second metrology devices generate first and second sets of optical metrology data, respectively, at a first orientation with respect to the sample. After the sample is rotated, the first and second metrology devices generate third and fourth sets of optical metrology data. The first, second, third, and fourth sets of data can then be used to determine one or more parameters of the sample.
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