POLYIMIDE RESIN COMPOSITION FOR USE IN FORMING INSULATION FILM IN PHOTOVOLTAIC CELL AND METHOD OF FORMING INSULATION FILM IN PHOTOVOLTAIC CELL USED THEREWITH

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United States of America Patent

APP PUB NO 20130233381A1
SERIAL NO

13822941

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Abstract

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Disclosed is a polyimide resin composition for forming an insulation layer in a solar cell, which has an optimal rheological characteristics for screen printing and the like, which has an improved wetting property with various coating substrates, by which continuous printing of 500 times or more can be attained, with which blisters, cissing and pinholes are not generated after printing and drying or during drying or curing, which can coat a predetermined area. A method of forming an insulation layer in a solar cell and a solar cell having the insulation layer formed by this method are also disclosed. The polyimide resin composition for forming an insulation layer in a solar cell contains a mixed solvent of a first organic solvent (A) and a second organic solvent (B); and a heat-resistant polyimide resin having at least one group selected from the group consisting of alkyl groups and perfluoroalkyl groups in recurring units, and having thixotropic property, the polyimide resin being dissolved in the mixed solvent.

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Patent Owner(s)

Patent OwnerAddress
PI R&D CO LTDYOKOHAMA-SHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goshima, Toshiyuki Yokohama-shi, JP 20 61
Sato, Takahiro Yokohama-shi, JP 382 4018
Win, Maw Soe Yokohama-shi, JP 16 58

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