Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam
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United States of America Patent
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Mar 14, 2013
filing date -
Sep 18, 2007
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Abstract
Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
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