Substrate Processing Apparatus
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United States of America Patent
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app pub date -
Mar 15, 2013
filing date -
Feb 15, 2007
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Abandoned
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Abstract
A substrate processing apparatus is composed of an indexer block, a first processing block and a second processing block that are provided in parallel with one another. The indexer block is provided with an indexer robot. The first processing block is provided with a plurality of back surface cleaning units and a first main robot. The second processing block is provided with a plurality of end surface cleaning units, a plurality of top surface cleaning units and a second main robot.
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