FLOW CELL DESIGN FOR UNIFORM RESIDENCE TIME FLUID FLOW
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United States of America Patent
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Issued Date -
Aug 1, 2013
app pub date -
Jan 10, 2013
filing date -
Jan 10, 2012
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Abandoned
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Abstract
Embodiments of a deposition reactor that compensates for lateral flow variation are disclosed. The reactor has at least one wall defining a deposition chamber comprising a first region and a second region, the wall having a purposely formed curvature defining a height of the deposition chamber. An inlet for a fluid comprising reactants or deposition material is in fluid communication with the deposition chamber. Portions of the fluid flowing through the deposition chamber have a residence time within the deposition chamber that varies by ≦20% across a cross-sectional width of the deposition chamber. The deposition chamber may further comprise an outlet in fluid communication with a third region. The reactor is suitable for depositing material layers having a uniform thickness. Methods of using the reactor also are disclosed.
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