COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20130193485A1
SERIAL NO

13731759

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Abstract

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An embodiment of a compound semiconductor device includes: an electron transit layer; an electron supply layer formed over the electron transit layer; a two-dimensional electron gas suppressing layer formed over the electron supply layer; an insulating film formed over the two-dimensional electron gas suppressing layer and the electron transit layer; and a gate electrode formed over the insulating film. The gate electrode is electrically connected with the two-dimensional electron gas suppressing layer.

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Patent Owner(s)

Patent OwnerAddress
TRANSPHORM JAPAN INCSHIN-YOKOHAMA CENTER BLDG 9F 2-5-15 SHIN-YOKOHAMA KOHOKU-KU YOKOHAMA KANAGAWA 222-0033

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akiyama, Shinichi Aizuwakamatsu, JP 52 681
Hosoda, Tsutomu Mie, JP 15 398
Miyamoto, Masato Aizuwakamatsu, JP 17 309

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