RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN

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Oct 7, 2011
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Oct 14, 2010

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Abstract

There is provided a resist underlayer film forming composition for forming a resist underlayer film providing heat resistance properties and hardmask characteristics. A resist underlayer film forming composition for lithography, comprising: a polymer containing a unit structure of Formula (1):

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NISSAN CHEMICAL INDUSTRIES LTD	7-1 KANDA-NISHIKI-CHO 3-CHOME CHIYODA-KU TOKYO 1010054

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Inventor Name	Address	# of filed Patents	Total Citations
Hashimoto, Keisuke	Toyama-shi, JP	136	1174
Kato, Masakazu	Toyama-shi, JP	121	882
Okuyama, Hiroaki	Toyama-shi, JP	19	190
Shinjo, Tetsuya	Toyama-shi, JP	72	321
Someya, Yasunobu	Toyama-shi, JP	31	154

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RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13825925

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13825925

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