Positive displacement pumping chamber
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United States of America Patent
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May 20, 2014
Grant Date -
Jul 25, 2013
app pub date -
Feb 22, 2013
filing date -
Oct 11, 2005
priority date (Note) -
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Abstract
A method is for processing a substrate. The method includes placing the substrate in a process volume and introducing a process gas or vapor into the process volume and/or subsequently removing gas or vapor from the volume. The step of introducing and/or removing the gas is at least partially performed by moving a movable wall to change the process volume in an appropriate sense.
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