FILTER FOR REMOVING MACRO-PARTICLES FROM A PLASMA BEAM

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United States of America Patent

APP PUB NO 20130180845A1
SERIAL NO

13876100

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A filter for filtering macro-particles from a plasma beam, having a bended duct for carriage of the plasma beam, the bended duct comprising an intermediate portion connected at one end to an inlet portion having a longitudinal axis disposed on an inlet plane and at another opposite end to an outlet portion having a longitudinal axis disposed on an outlet plane. The inlet portion allows the plasma beam containing macro-particles to travel toward the intermediate portion in an incident direction and the outlet portion allows the plasma beam to travel from the intermediate portion in an emergent direction. The intermediate portion is configured to deviate the incident direction to the emergent direction at an angle of more than 90° and thereby remove macro-particles from the plasma beam as it passes through the intermediate portion. The inlet plane and outlet plane are disposed at an offset angle from each other.

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Patent Owner(s)

Patent OwnerAddress
NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTDBLOCK 28 #02-02/03/04 AYER RAJAH CRESCENT AYER RAJAH INDUSTRIAL ESTATE SINGAPORE 139959

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shi, Xu Singapore, SG 48 218
Wei, Hao Singapore, SG 57 505

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